Search Constraints

Filtering by: Subject Cu/HfO2 Remove constraint Subject: Cu/HfO2

Search Results

  • Work
    Article
    Uttamchandani, Rajiv
    First-principles density functional theory is used to explore the possibility of tuning effective work function of high dielectric/metal gate stacks. Using HfOmath formula/Cu as an example, we demonstrate that the effective work function of the stack . . .